Application of angle-resolved XPS for characterisation of SiC/Ni 2Si thin film systems

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 859-862

  Perez Garcia S A ^a   Nyborg, L ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

ARXPS; Nickel silicide; Silicon carbide; Thin layers

Indexed keywords

BAND STRUCTURE; ELECTRONIC STRUCTURE; GRAPHITE; NICKEL; SILICON CARBIDE; SURFACE PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY (ARXPS); NICKEL SILICIDES; SURFACE LAYERS; THIN LAYERS;

THIN FILMS;

EID: 33646544745     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2215     Document Type: Conference Paper

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