Conformal deposition of a silicon-oxide and a fluorocarbon on a nano-shaped material in supercritical carbon dioxide

Materials Research Society Symposium Proceedings

Volumn 890, Issue , 2006, Pages 119-124

  Shimizu, Takashi ^a   Ishii, Kenichi ^a   Suzuki, Eiichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FLUOROCARBONS; PROTECTIVE COATINGS; SUPERCRITICAL FLUIDS; SURFACE TREATMENT;

CONFORMAL DEPOSITIONS; MICROELECTROMECHANICAL SYSTEMS; SILICON-OXIDE FILMS; SURFACE ENGINEERING;

NANOSTRUCTURED MATERIALS;

EID: 33646397597     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. J. M. Blackburn, D. P. Long, A. Cabanas, and J. J. Watkins, Science 294 141 (2001).
2. N. G. Smart,T. Carleson, T. Kast, A. A. Clifford, M. D. Burford, and C. M. Wai, Talanta 44, 137 (1997).
3. G. J. M. Dormans, Journal of Crystal Growth 108, 806 (1991).
4. Tetrakishexafluoroacetylacetonatozirconium.
5. Tetratertiarybutoxyzirconium.
6. Tetrakis[1-dimethylamino-2-propoxy]silane.
7. An amorphous, soluble perfluoropolymer purchased from Asahi Glass Co.,Ltd.