Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 264-265

  Sugiyama, S ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; LITHOGRAPHY; NANOTECHNOLOGY; SYNCHROTRONS;

3-D MEMS; FINE-SCALE; HIGH ASPECT RATIO MICROSTRUCTURES; MEMS FABRICATION; OPTICAL WAVELENGTH; SUBMICRON SCALE;

SYNCHROTRON RADIATION;

EID: 33646225598     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984190     Document Type: Conference Paper

References (4)

1. S. Takimoto, R. Kondo, K. Suzuki and S. Sugiyama, Proceeding of the IEEE 1999 International Symposium on Micromechatronics and Human Science, pp.221-226, 1999.
2. H. Ueno, N. Nishi and S. Sugiyama, Trans. IEE of Japan, Vol. 120-E, No. 7, pp.339-344, 2000.
3. S. Sugiyama and H. Ueno, Digest of Technical Papers, The 11th International Conference on Solid-State Sensors and Actuators (Transducers'01), pp.1574-1577, 2001.
4. T. Katoh, N. Nishi, M. Fukagawa, H. Ueno and S. Sugiyama, Direct Writing for Three-Dimensional Microfabrication Using Synchrotron Radiation Etching, Sensors and Actuators, A-Physical, Vol. 89, pp.10-15, 2001.