Few-electron quantum dot fabricated with layered scanning force microscope lithography

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 32, Issue 1-2 SPEC. ISS., 2006, Pages 5-8

  Sigrist, M ^a   Gustavsson, S ^a   Ihn, T ^a   Ensslin, K ^a   Driscoll, D ^b   Gossard, A ^b   Reinwald, M ^c   Wegscheider, W ^c  

^a ETH ZURICH   (Switzerland)

^b University of California   (United States)

^c UNIVERSITY OF REGENSBURG   (Germany)

Author keywords

Few electron quantum dot; Layered lithography; Scanning force microscope

Indexed keywords

ELECTRIC CONDUCTANCE; ELECTRONS; LITHOGRAPHY; MAGNETIC FIELDS; MICROSCOPIC EXAMINATION; NANOSTRUCTURED MATERIALS; OXIDATION;

FEW-ELECTRON QUANTUM DOTS; LAYERED LITHOGRAPHY; NANOSTRUCTURE DESIGN; SCANNING FORCE MICROSCOPE;

SEMICONDUCTOR QUANTUM DOTS;

EID: 33646176395     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2005.12.128     Document Type: Article

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