Single crystal like thin films by selective ion-induced grain growth

Scripta Materialia

Volumn 55, Issue 1 SPEC. ISS., 2006, Pages 103-106

  Spolenak, Ralph ^a,b   Prado, M Teresa Pérez ^c  

^a ETH ZURICH   (Switzerland)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c DEPARTMENT OF PHYSICAL METALLURGY   (Spain)

Author keywords

Au; Channeling; FIB; Ion bombardment; Sputtering

Indexed keywords

GOLD; GRAIN GROWTH; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MICROELECTRONIC PROCESSING; MOLECULAR BEAM EPITAXY; RELIABILITY; SINGLE CRYSTALS; SPUTTERING; TEXTURES;

CHANNELING; FIB; ION-INDUCED GRAIN GROWTH; MICROELECTRONIC DEVICES; TEXTURE CONTROL;

THIN FILMS;

EID: 33646174449     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2006.03.030     Document Type: Article

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