Chemical vapor phase etching of polycrystalline selective to epitaxial Si and SiGe

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 297-300

  Yamamoto, Yuji ^a   Tillack, Bernd ^a   Köpke, Klaus ^a   Fursenko, Oksana ^a  

^a IHP   (Germany)

Author keywords

HCl etching; Selective; Si; SiGe

Indexed keywords

CATALYST SELECTIVITY; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; ETCHING; HYDROCHLORIC ACID; SILICON; VAPOR PHASE EPITAXY;

HCL ETCHING; MICROLOADING EFFECT; SELECTIVE; SIGE;

POLYCRYSTALLINE MATERIALS;

EID: 33646115820     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.390     Document Type: Article

References (5)

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