Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 1101-1106

  Jourlin, Y ^a   Jay, J ^a   Pigeon, F ^a   Bouchet, G ^a   Parriaux, O ^a   van Dijk, P ^b   Pellens, R ^b   Topcu S ^c   Alayli, Y ^c   Bonis, M ^c  

^a UNIVERSITÉ JEAN MONNET   (France)

^b ASML   (Netherlands)

^c UNIVERSITÉ DE TECHNOLOGIE DE COMPIÈGNE   (France)

Author keywords

Aberrations; Diffraction gratings; Diffractive optical elements; Displacement sensor; Photolithography; Step and repeat camera

Indexed keywords

ABERRATIONS; CAMERAS; DIFFRACTION GRATINGS; ERROR ANALYSIS; INTERFEROMETRY; MICROELECTRONICS; OPTICAL SENSORS; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS;

OPTICAL GRATING;

WSI CIRCUITS;

EID: 0036643693     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00472-0     Document Type: Article

References (2)

1. Performance of interferometric rotation encoder using diffraction gratings
2. Microelectronics planar technologies for the manufacturing of high spatial frequency gratings: Sub-Angström assessment of spatial coherence