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Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 994-1002

Simulation software for designing electron and ion beam equipment

Author keywords

Aberration correctors; Charged particle optics; Coulomb interactions; Electron energy filters; Electron guns; Electron mirrors; LEEM; Magnetic prisms; Multipole lenses

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRON GUNS; ELECTRON MICROSCOPY; NANOTECHNOLOGY; SOFTWARE ENGINEERING;

EID: 33646062288     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.076     Document Type: Article
Times cited : (25)

References (20)
  • 6
    • 23244450304 scopus 로고    scopus 로고
    • H. Arimoto, Recent Progress of Electron Projection Lithography, in: Proceedings of the Microprocesses and Nanotechnology Conference, 2004.
  • 7
    • 0002685951 scopus 로고
    • Rose H. Optik 85 (1990) 19
    • (1990) Optik , vol.85 , pp. 19
    • Rose, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.