Cost of ownership - projecting the future

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 614-618

  Trybula, Walt ^a  

^a SEMATECH   (United States)

Author keywords

CoO; Cost of Ownership; Mask costs; Nano imprint

Indexed keywords

LITHOGRAPHY; MASKS; NANOTECHNOLOGY;

COO; COST OF OWNERSHIP; MASK COSTS; NANO-IMPRINT;

MICROELECTRONICS;

EID: 33646056996     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.019     Document Type: Article

References (8)

1. Financial impact of technology acceleration on semiconductor masks. Trybula W.J., Kimmel K.R., and Grenon B.J. Proc. SPIE Int. Soc. Opt. Eng. 4562 (2002) 321
2. Does technology acceleration equate to mask cost acceleration?. Trybula W.J., and Grenon B.J. Proc. SPIE Int. Soc. Opt. Eng. 5043 (2003) 93
3. Note: Queuing reduces the actual throughput of equipment and increase the CoO. Static modeling does not consider the queuing impact.
4. A common base for mask cost of ownership. Trybula W.J. Proc. SPIE Int. Soc. Opt. Eng. 5256 (2003) 318
5. Grant Willson, Personal communications.
6. S-FIL Technology: Cost of Ownership Case Study. Murthy S., Falcon M., Sreenivasan S.V., and Dance D. WWK Applied Cost Modeling 11 2 (2004). Available from
7. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments. Hector S. Proc. SPIE Int. Soc. Opt. Eng 5592 (2005)
8. Direct imprinting of dielectric materials for dual damascene processing. Stewart M. Proc. SPIE Int. Soc. Opt. Eng 5751 (2005)