Financial impact of technology acceleration on semiconductor masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 321-328

  Trybula, Walt J ^a   Kimmel, K R ^a   Grenon, B J ^b,c  

^a SEMATECH   (United States)

^b Grenon Consulting Inc   (United States)

^c Grenon Consulting   (United States)

Author keywords

Cost of Ownership; Lithography Masks; Mask CoO; Mask Processing; Technology Acceleration

Indexed keywords

COSTS; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; PRODUCTIVITY;

SEMICONDUCTOR MASKS;

MASKS;

EID: 0035763478     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458307     Document Type: Article

References (1)

1. Th Annual BACUS Symposium on Photomask Technology. Brain Grenon, Giang Dao, Editors. Proceedings of SPIE Vol. 4186 (2001). Pp 733-748.