Polarization effects in plasmonic masks

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 919-922

  Schellenberg, Frank ^a   Adam, Kostas ^a   Sun, Liying ^b   Matteo, Joe ^b   Hesselink, Lambertus ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

DDM; FDTD; Lithography; OPC; Photomask; Plasmon; Polarization; RET; Reticle; SRAF

Indexed keywords

LIGHT TRANSMISSION; LITHOGRAPHY; MASKS; THIN FILMS; TIME DOMAIN ANALYSIS; VECTORS;

DDM; FDTD; OPC; PHOTOMASK; PLASMON; RET; RETICLE; SRAF;

POLARIZATION;

EID: 33646049080     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.232     Document Type: Article

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