Electron-beam lithography simulation for EUV mask applications

Journal of Physics: Conference Series

Volumn 10, Issue 1, 2005, Pages 385-388

  Patsis, G P ^a   Glezos, N ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22544470024     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/10/1/094     Document Type: Article

References (4)

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2. Williamson W, Jr, G C Duncan 1986 Am. J. Phys. 54 (3) 262
3. Williamson W, Jr, Antonak A J and Meredith R J 1987 J. Appl. Phys. 61 (9) 4612
4. Dapor M 1992 Phys. Rev. B 46 (2) 618