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Volumn 192, Issue 1-3, 2006, Pages 234-240
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Study on plasma polymerization of 1.1.1-trifluoroethane: deposition and structure of plasma polymer films
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Author keywords
1.1.1 trifluoroethane; Chemical structure; Deposition rate; Plasma polymer film
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Indexed keywords
CHEMICAL REACTORS;
CROSSLINKING;
DEPOSITION;
MOLECULAR STRUCTURE;
MONOMERS;
PLASMA APPLICATIONS;
FLUOROPOLYMER FILMS;
PLASMA POLYMER FILMS;
TRIFLUOROETHANE;
PLASMA POLYMERIZATION;
CHEMICAL REACTORS;
CROSSLINKING;
DEPOSITION;
MOLECULAR STRUCTURE;
MONOMERS;
PLASMA APPLICATIONS;
PLASMA POLYMERIZATION;
DEPOSITION;
FILM;
PLASMA;
POLYMERIZATION;
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EID: 33645954592
PISSN: 00119164
EISSN: None
Source Type: Journal
DOI: 10.1016/j.desal.2005.10.017 Document Type: Article |
Times cited : (7)
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References (16)
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