Hexafluoropropylene plasmas: Polymerization rate-reaction parameter relationships

Polymer Engineering and Science

Volumn 36, Issue 20, 1996, Pages 2542-2549

  Silverstein, M S ^a   Chen, R ^a   Kesler, O ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DEPOSITION; FLUORINE CONTAINING POLYMERS; MASS TRANSFER; MONOMERS; PLASMA APPLICATIONS; PLASMA ETCHING; PRESSURE EFFECTS; REACTION KINETICS; STRUCTURE (COMPOSITION); THIN FILMS;

HEXAFLUOROPROPYLENE PLASMAS; MONOMER FLOW RATE; PLASMA POWER; REACTOR PRESSURE;

POLYMERIZATION;

EID: 0030262742     PISSN: 00323888     EISSN: None     Source Type: Journal    
DOI: 10.1002/pen.10653     Document Type: Article

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