The Lithography Expert: The Rayleigh depth of focus

Microlithography World

Volumn 13, Issue 1, 2004, Pages 14-15

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NUMERICAL APERTURES; OPTICAL PATH DIFFERENCE (OPD);

COMPUTATIONAL GEOMETRY; CURVE FITTING; ERROR ANALYSIS; FIBER BRAGG GRATINGS; FOCUSING; IMAGING TECHNIQUES; LENSES; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; REFRACTIVE INDEX;

RAYLEIGH SCATTERING;

EID: 1642355922     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. http://www.nobel.se/physics/laureates/1904/strutt-bio.html.
2. 3 Coefficient in Nonparaxial λ/NA Scalling Equations for Resolution, Depth of Focus, and Immersion Lithography," Journal of Microlithography, Microfabrication, and Microsystems, Vol. 1, No. 1, pp.7-12, April 2002.