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1
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4243057262
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Electrochemical engineering in an age of discovery and innovation
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R. C. Alkire and R. D. Braatz, "Electrochemical Engineering in an Age of Discovery and Innovation," AlChE J., 50, 2000-2007 (2004);
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(2004)
AlChE J.
, vol.50
, pp. 2000-2007
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Alkire, R.C.1
Braatz, R.D.2
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2
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33645641756
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A multiscale systems approach to microelectronic processes
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Lake Louise, Alberta, Canada, in press; and references cited therein
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R. D. Braatz, R. C. Alkire, and E. G. Seebauer, "A Multiscale Systems Approach to Microelectronic Processes," In Proc. of the Int. Conf. on Chemical Process Control, Lake Louise, Alberta, Canada, in press; and references cited therein.
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Proc. of the Int. Conf. on Chemical Process Control
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Braatz, R.D.1
Alkire, R.C.2
Seebauer, E.G.3
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3
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0000614806
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Modeling of metal thin film growth: Linking angstrom-scale molecular dynamics results to micron-scale film topographies
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U. Hansen, S. Rodgers, and K. F. Jensen, "Modeling of Metal Thin Film Growth: Linking Angstrom-scale Molecular Dynamics Results to Micron-scale Film Topographies," Phys. Rev. B, 62, 2869-2878 (2000).
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(2000)
Phys. Rev. B
, vol.62
, pp. 2869-2878
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Hansen, U.1
Rodgers, S.2
Jensen, K.F.3
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4
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0001460414
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Molecular dynamics-based ion-surface interaction modes for ionized physical vapor deposition feature scale simulations
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D. G. Coronell, D. E. Hansen, A. F. Voter, C.-L. Liu, X.-Y. Liu, and J. D. Kress, "Molecular Dynamics-based Ion-surface Interaction Modes for Ionized Physical Vapor Deposition Feature Scale Simulations," Appl. Phys. Lett., 73, 3860-3862 (1998).
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(1998)
Appl. Phys. Lett.
, vol.73
, pp. 3860-3862
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Coronell, D.G.1
Hansen, D.E.2
Voter, A.F.3
Liu, C.-L.4
Liu, X.-Y.5
Kress, J.D.6
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6
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0030158774
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Quasicontinuum analysis of defects in solids
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E. B. Tadmor, M. Ortiz, and R. Phillips, "Quasicontinuum Analysis of Defects in Solids," Philos. Mag. A - Phys. Cond. Matter Struct. Defects Mech. Prop., 73, 1529-1563 (1996).
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(1996)
Philos. Mag. A - Phys. Cond. Matter Struct. Defects Mech. Prop.
, vol.73
, pp. 1529-1563
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Tadmor, E.B.1
Ortiz, M.2
Phillips, R.3
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7
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0033121676
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Finite element and monte carlo simulation of submicrometer silicon n-MOSFET's
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D. Hadji, Y. Marechal, and J. Zimmerman, "Finite Element and Monte Carlo Simulation of Submicrometer Silicon n-MOSFET's," IEEE Trans, on Magnetics, 35, 1809-1812 (1999).
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(1999)
IEEE Trans, on Magnetics
, vol.35
, pp. 1809-1812
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Hadji, D.1
Marechal, Y.2
Zimmerman, J.3
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8
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0031276392
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A multiscale simulator for low pressure chemical vapor deposition
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M. K. Gobbert, T. P. Merchant, L. J. Borucki, and T. S. Cale, "A Multiscale Simulator for Low Pressure Chemical Vapor Deposition," J. Electrochem. Soc., 144, 3945-3951 (1997).
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(1997)
J. Electrochem. Soc.
, vol.144
, pp. 3945-3951
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Gobbert, M.K.1
Merchant, T.P.2
Borucki, L.J.3
Cale, T.S.4
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10
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0000108193
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Multiscale modeling of chemical vapor deposition
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S. T. Rodgers and K. F. Jensen, "Multiscale Modeling of Chemical Vapor Deposition," J. Appl. Phys., 83, 524-530 (1998).
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(1998)
J. Appl. Phys.
, vol.83
, pp. 524-530
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Rodgers, S.T.1
Jensen, K.F.2
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11
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0032614177
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The role of macrotransport phenomena in film microstructure during epitaxial growth
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D. G. Vlachos, "The Role of Macrotransport Phenomena in Film Microstructure During Epitaxial Growth," Appl. Phys. Lett., 74, 2797-2799 (1999).
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(1999)
Appl. Phys. Lett.
, vol.74
, pp. 2797-2799
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Vlachos, D.G.1
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12
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0033751334
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Multiple scale integrated modeling of deposition processes
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T. P. Merchant, M. K. Gobbert, T. S. Cale, and L. J. Borucki, "Multiple Scale Integrated Modeling of Deposition Processes," Thin Solid Films, 365, 368-375 (2000).
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(2000)
Thin Solid Films
, vol.365
, pp. 368-375
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Merchant, T.P.1
Gobbert, M.K.2
Cale, T.S.3
Borucki, L.J.4
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13
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0036531422
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Integrated multiscale process simulation
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T. S. Cale, M. O. Bloomfield, D. F. Richards, K. E. Jansen, and M. K. Gobbert, "Integrated Multiscale Process Simulation," Computational Materials Science, 23, 3-14 (2002).
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(2002)
Computational Materials Science
, vol.23
, pp. 3-14
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Cale, T.S.1
Bloomfield, M.O.2
Richards, D.F.3
Jansen, K.E.4
Gobbert, M.K.5
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14
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1042302790
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Coupled mesoscale-continuum simulations of copper electrodeposition in a trench
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T. O. Drews, E. G. Webb, D. L. Ma, J. Alameda, R. D. Braatz, and R. C. Alkire, "Coupled Mesoscale-Continuum Simulations of Copper Electrodeposition in a Trench," AlChE J., 50, 226-240 (2004).
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(2004)
AlChE J.
, vol.50
, pp. 226-240
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Drews, T.O.1
Webb, E.G.2
Ma, D.L.3
Alameda, J.4
Braatz, R.D.5
Alkire, R.C.6
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15
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33645647321
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Predictor-corrector methods for dynamically coupling multiscale simulation codes
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Paper 439b, AlChE Annual Meeting, Austin, TX, November 7-12, and citations therein
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Y. He, J. R. Gray, R. C. Alkire, and R. D. Braatz, "Predictor- Corrector Methods for Dynamically Coupling Multiscale Simulation Codes," In Proc. of the Topical Conf. on Coupling Theory, Molecular Simulations and Computational Chemistry to the Physical World, Paper 439b, AlChE Annual Meeting, Austin, TX, November 7-12 (2004), and citations therein.
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(2004)
Proc. of the Topical Conf. on Coupling Theory, Molecular Simulations and Computational Chemistry to the Physical World
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He, Y.1
Gray, J.R.2
Alkire, R.C.3
Braatz, R.D.4
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16
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10044222037
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Systems analysis and design of dynamically coupled multiscale reactor simulation codes
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E. Rusli, T. O. Drews, and R. D. Braatz, "Systems Analysis and Design of Dynamically Coupled Multiscale Reactor Simulation Codes," Chem. Eng. Sci., 59, 5607-5613 (2004).
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(2004)
Chem. Eng. Sci.
, vol.59
, pp. 5607-5613
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Rusli, E.1
Drews, T.O.2
Braatz, R.D.3
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17
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28244449320
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Perspectives on the design and control of multiscale systems
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in press
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R. D. Braatz, R. C. Alkire, E. Seebauer, E. Rusli, R. Gunawan, T. O. Drews, and Y. He, "Perspectives on the Design and Control of Multiscale Systems," J. of Process Control, in press.
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J. of Process Control
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Braatz, R.D.1
Alkire, R.C.2
Seebauer, E.3
Rusli, E.4
Gunawan, R.5
Drews, T.O.6
He, Y.7
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