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Volumn , Issue , 2005, Pages 11616-11618

Guidelines for the design of multiscale simulation codes

Author keywords

[No Author keywords available]

Indexed keywords


EID: 33645642218     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (17)
  • 1
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    • Electrochemical engineering in an age of discovery and innovation
    • R. C. Alkire and R. D. Braatz, "Electrochemical Engineering in an Age of Discovery and Innovation," AlChE J., 50, 2000-2007 (2004);
    • (2004) AlChE J. , vol.50 , pp. 2000-2007
    • Alkire, R.C.1    Braatz, R.D.2
  • 2
    • 33645641756 scopus 로고    scopus 로고
    • A multiscale systems approach to microelectronic processes
    • Lake Louise, Alberta, Canada, in press; and references cited therein
    • R. D. Braatz, R. C. Alkire, and E. G. Seebauer, "A Multiscale Systems Approach to Microelectronic Processes," In Proc. of the Int. Conf. on Chemical Process Control, Lake Louise, Alberta, Canada, in press; and references cited therein.
    • Proc. of the Int. Conf. on Chemical Process Control
    • Braatz, R.D.1    Alkire, R.C.2    Seebauer, E.G.3
  • 3
    • 0000614806 scopus 로고    scopus 로고
    • Modeling of metal thin film growth: Linking angstrom-scale molecular dynamics results to micron-scale film topographies
    • U. Hansen, S. Rodgers, and K. F. Jensen, "Modeling of Metal Thin Film Growth: Linking Angstrom-scale Molecular Dynamics Results to Micron-scale Film Topographies," Phys. Rev. B, 62, 2869-2878 (2000).
    • (2000) Phys. Rev. B , vol.62 , pp. 2869-2878
    • Hansen, U.1    Rodgers, S.2    Jensen, K.F.3
  • 4
    • 0001460414 scopus 로고    scopus 로고
    • Molecular dynamics-based ion-surface interaction modes for ionized physical vapor deposition feature scale simulations
    • D. G. Coronell, D. E. Hansen, A. F. Voter, C.-L. Liu, X.-Y. Liu, and J. D. Kress, "Molecular Dynamics-based Ion-surface Interaction Modes for Ionized Physical Vapor Deposition Feature Scale Simulations," Appl. Phys. Lett., 73, 3860-3862 (1998).
    • (1998) Appl. Phys. Lett. , vol.73 , pp. 3860-3862
    • Coronell, D.G.1    Hansen, D.E.2    Voter, A.F.3    Liu, C.-L.4    Liu, X.-Y.5    Kress, J.D.6
  • 7
    • 0033121676 scopus 로고    scopus 로고
    • Finite element and monte carlo simulation of submicrometer silicon n-MOSFET's
    • D. Hadji, Y. Marechal, and J. Zimmerman, "Finite Element and Monte Carlo Simulation of Submicrometer Silicon n-MOSFET's," IEEE Trans, on Magnetics, 35, 1809-1812 (1999).
    • (1999) IEEE Trans, on Magnetics , vol.35 , pp. 1809-1812
    • Hadji, D.1    Marechal, Y.2    Zimmerman, J.3
  • 8
    • 0031276392 scopus 로고    scopus 로고
    • A multiscale simulator for low pressure chemical vapor deposition
    • M. K. Gobbert, T. P. Merchant, L. J. Borucki, and T. S. Cale, "A Multiscale Simulator for Low Pressure Chemical Vapor Deposition," J. Electrochem. Soc., 144, 3945-3951 (1997).
    • (1997) J. Electrochem. Soc. , vol.144 , pp. 3945-3951
    • Gobbert, M.K.1    Merchant, T.P.2    Borucki, L.J.3    Cale, T.S.4
  • 10
    • 0000108193 scopus 로고    scopus 로고
    • Multiscale modeling of chemical vapor deposition
    • S. T. Rodgers and K. F. Jensen, "Multiscale Modeling of Chemical Vapor Deposition," J. Appl. Phys., 83, 524-530 (1998).
    • (1998) J. Appl. Phys. , vol.83 , pp. 524-530
    • Rodgers, S.T.1    Jensen, K.F.2
  • 11
    • 0032614177 scopus 로고    scopus 로고
    • The role of macrotransport phenomena in film microstructure during epitaxial growth
    • D. G. Vlachos, "The Role of Macrotransport Phenomena in Film Microstructure During Epitaxial Growth," Appl. Phys. Lett., 74, 2797-2799 (1999).
    • (1999) Appl. Phys. Lett. , vol.74 , pp. 2797-2799
    • Vlachos, D.G.1
  • 12
    • 0033751334 scopus 로고    scopus 로고
    • Multiple scale integrated modeling of deposition processes
    • T. P. Merchant, M. K. Gobbert, T. S. Cale, and L. J. Borucki, "Multiple Scale Integrated Modeling of Deposition Processes," Thin Solid Films, 365, 368-375 (2000).
    • (2000) Thin Solid Films , vol.365 , pp. 368-375
    • Merchant, T.P.1    Gobbert, M.K.2    Cale, T.S.3    Borucki, L.J.4
  • 14
    • 1042302790 scopus 로고    scopus 로고
    • Coupled mesoscale-continuum simulations of copper electrodeposition in a trench
    • T. O. Drews, E. G. Webb, D. L. Ma, J. Alameda, R. D. Braatz, and R. C. Alkire, "Coupled Mesoscale-Continuum Simulations of Copper Electrodeposition in a Trench," AlChE J., 50, 226-240 (2004).
    • (2004) AlChE J. , vol.50 , pp. 226-240
    • Drews, T.O.1    Webb, E.G.2    Ma, D.L.3    Alameda, J.4    Braatz, R.D.5    Alkire, R.C.6
  • 16
    • 10044222037 scopus 로고    scopus 로고
    • Systems analysis and design of dynamically coupled multiscale reactor simulation codes
    • E. Rusli, T. O. Drews, and R. D. Braatz, "Systems Analysis and Design of Dynamically Coupled Multiscale Reactor Simulation Codes," Chem. Eng. Sci., 59, 5607-5613 (2004).
    • (2004) Chem. Eng. Sci. , vol.59 , pp. 5607-5613
    • Rusli, E.1    Drews, T.O.2    Braatz, R.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.