Electrical characterization of nickel oxide thin films deposited by reactive sputtering for memory applications

Integrated Ferroelectrics

Volumn 74, Issue , 2005, Pages 71-77

  Lee, Jang Woo ^a   Park, Ik Hyun ^a   Chung, Chee Won ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DATA STORAGE EQUIPMENT; DEPOSITION; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; MICROSTRUCTURE; NICKEL COMPOUNDS; THERMAL EFFECTS;

FILM CRYSTALLINITY; NICKEL OXIDE THIN FILMS; REACTIVE SPUTTERING; SWITCHING PROPERTIES;

THIN FILMS;

EID: 33645528448     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580500413921     Document Type: Conference Paper

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