Electrochemical and electrochromic behavior of reactively sputtered nickel oxide

Journal of the Electrochemical Society

Volumn 144, Issue 6, 1997, Pages 1995-2003

  Miller, Eric L ^a   Rocheleau, Richard E ^a  

^a UNIVERSITY OF HAWAII   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CATALYSTS; CRYSTAL ORIENTATION; ELECTROCHEMISTRY; ELECTROCHROMISM; FILM GROWTH; GRAIN BOUNDARIES; MORPHOLOGY; NICKEL COMPOUNDS; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; THIN FILMS;

NICKEL OXIDE;

OPTICAL FILMS;

EID: 0031168883     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837734     Document Type: Article

References (53)

1. B. Kunz, J. Phys. C, Solid State Phys., 14, L455 (1981).
2. P. Cox, Transition Metal Oxides, p. 130, Oxford University Press, Oxford, (1992).
3. H. Sato, T. Minami, S. Takata, and T. Yamada, Thin Solid Films, 236, 27 (1993).
4. C. Ottermann and K. Bange, Phys. Rev. B, 44, 5927 (1991).
5. S. Passerini and B. Scrosati, This Journal, 141, 889 (1994).
6. R. Compton, Comprehensive Chemical Kinetics; Electrode Kinetics: Reactions, Vol. 27, p. 278, Elsevier Science Publishers, Amsterdam (1987).
7. E. Antolini, J. Mater. Sci., 27, 3335 (1992).
8. D. Pletcher, Industrial Electrochemistry, p. 134, Chapman and Hall, London (1982).
9. Electrodes of Conductive Metallic Oxides: Part B, S. Trasatti, Editor, p. 560, Elsevier Scientific Publishing, New York (1981).
10. J. Gras and P. Spiteri, Int. J. Hydrogen Energy, 18, 561 (1993).
11. M. Kibria and M. Mridha, ibid., 21, 179 (1996).
12. K. Schultze and H. Bartelt, ibid., 17, 711 (1992).
13. Electrochemistry of Novel Materials: Frontiers of Electrochemistry, J. Lipkowski and P. N. Ross, Editors, p. 244, VCH Publishers, New York (1994).
14. Electrochemical Hydrogen Technologies, H. Wendt, Editor, p. 104, Elsevier Science Publishers, Amsterdam (1990).
15. Proceedings of the Symposium on the Nickel Electrode, R. Gunther, Editor, PV 82-4, The Electrochemical Society Proceedings Series, Pennington, NJ (1982).
16. Hydrogen Storage Materials, Batteries, and Electrochemistry, D. A. Corrigan and S. Srinivasan, Editors, PV 92-5, The Electrochemical Society Proceedings Series, Pennington, NJ (1992).
17. A. Angelo, E. Gonzalez, and L. Avaca, Int. J. Hydrogen Energy, 16, 1 (1991).
18. P. Rasiyah, A. Tseung, and D. Hibbert, This Journal, 129, 1724 (1982).
19. J. Haenen, W. Visscher, and E. Barendrecht, J. Appl. Electrochem., 5, 29 (1985).
20. J. O'M. Bockris, T. Otagawa, and V. Young, J. Electroanal. Chem, 150, 633 (1983).
21. P. Vermeiren, R. Leysen, H. King, G. Murphy, and H. Vanenborre, Adv. Hydrogen Energy, 5, 431 (1986).
22. J. Botejue Nadesan and A. Tseung, This Journal, 132, 2957 (1985).
23. L. Brossard, Int. J. Hydrogen Energy, 16, 87 (1991).
24. A. Kamnev, B. Eshov, and O. Malandin, Sov. Electrochem. 25, 1002 (1989).
25. D. Corrigan, This Journal, 134, 377 (1987).
26. W. Estrada, A. Andersson, and C. Graqvist, J. Mater. Res., 6, 1715 (1991).
27. D. Wruck, M. Dixon, M. Rubin, and S. Bogy, J. Vac. Sci. Technol. A, 9, 2170 (1991).
28. S. Cordoba-Torresi, C. Gabrielli, A. Hugot-Le Goff, and R. Torres, This Journal, 138, 1548 (1991).
29. S. Cordoba-Torresi, A. Hugot-Le Goff, and S. Joiret, ibid., 138, 1554 (1991).
30. M. Carpenter, R. Conell, and D. Corrigan, Sol. Energy Mater. Sol. Cells, 16, 333 (1987).
31. J. Svensson and C. Granqvist, ibid., 16, 19 (1987).
32. P. Yu and C. Lampert, SPIE J., 823, 113 (1987).
33. Topics in Applied Physics, Display Devices, Vol. 40, J. Pankove, Editor, p. 181, Springer-Verlag, Berlin (1980).
34. G. Beni and J. Shay, Adv. Image Pickup Displ. 5, 83 (1982).
35. R. E. Carbonio, V. Macagno, and M. Giordano, This Journal, 129, 983 (1982).
36. A. Agrawal, H. Habibi, R. Agrawal, J. Cronin, D. Roberts, R. Caron-Popowich, and C. Lampert, Thin Solid Films, 221, 239 (1992).
37. N. Lynam and H. Habibi, SPIE, J., 1016, 63 (1988).
38. P. Delichere, S. Joiret, and A. Hugot-Le Goff, This Journal, 135, 983 (1988).
39. S. Yamada, T. Yoshioka, M. Miyashita, K. Urabe, and M. Kitao, J. Appl. Phys., 63, 2116 (1988).
40. A. Andersson, W. Estrada, and C. Granqvist, SPIE, J., 1272, 96 (1990).
41. J. Svensson and C. Granqvist, Appl. Opt., 26, 1554 (1987).
42. F. Decker, S. Passerini, R. Pileggi, and B. Scrosati, Electrochim. Acta, 37, 1003 (1992).
43. K. Yoshimura, T. Miki, and S. Tanemura, Jpn. J. Appl. Phys. 34, 2440 (1995).
44. R. Rocheleau and E. Miller, Int. J. Hydrogen Energy, 22, 771 (1997).
45. F. Buteau, P. Demange, C. Moreau, R. Gros-Bonnivard, and J. Jud, ibid., 18, 727 (1993).
46. D. Schroder, Semiconductor Material and Device Characterization, p. 114, John Wiley & Sons, New York (1990).
47. A. Bard and L. Faulkner, Electrochemical Methods, Fundamentals and Applications, John Wiley & Sons, New York (1980).
48. Handbook of Chemistry and Physics, 76th ed., D. Lide, Editor, p. 63, CRC Press, Boca Raton, FL (1995).
49. E. Kusano, J. Appl. Phys., 73, 8565 (1993).
50. Thin Film Processes, J. Vossen and W. Kern, Editors, p. 48, Academic Press, Orlando, FL (1978).
51. Joint Committee on Powder Diffraction Standards, Mineral Powder Diffraction File, Card No. 4-835, JCPDS, Swarthmore, PA (1983).
52. Ibid., Card No. 14-481 (1983).
53. L. Azaroff, Elements of X-Ray Crystallography, p. 531, McGraw-Hill Book Co., New York (1968).