SEBS aggregate patterning at a surface studied by atomic force microscopy

Langmuir

Volumn 22, Issue 7, 2006, Pages 3428-3433

  Han, Xia ^a   Hu, Jun ^a   Liu, Honglai ^a   Hu, Ying ^a  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DILUTE BLOCK COPOLYMER SOLUTION; POLYMER CONCENTRATION; SEBS AGGREGATE PATTERNING; ULTRASONIC TREATMENT;

ATOMIC FORCE MICROSCOPY; CONCENTRATION (PROCESS); COPOLYMERS; MICA; SOLUTIONS; SOLVENTS; SPIN COATING; THERMAL EFFECTS; ULTRASONIC EFFECTS;

THIN FILMS;

ALUMINUM SILICATE; C FLEX; C-FLEX; MICA; POLYETHYLENE DERIVATIVE; POLYMER; POLYSTYRENE DERIVATIVE; STYRENE ETHYLENE BUTYLENE STYRENE BLOCK COPOLYMER; STYRENE-ETHYLENE-BUTYLENE-STYRENE-BLOCK COPOLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; SPIN LABELING; SURFACE PROPERTY;

ALUMINUM SILICATES; MICROSCOPY, ATOMIC FORCE; POLYETHYLENES; POLYMERS; POLYSTYRENES; SPIN LABELS; SURFACE PROPERTIES;

EID: 33645528252     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la051293i     Document Type: Article

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