Characterization and modeling of antireflective coatings of Si O 2, Si3 N4, and Si Ox Ny deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 823-827

  Mestanza, S N M ^a   Obrador, M P ^b   Rodriguez, E ^a   Biasotto, C ^a   Doi, I ^a   Diniz, J A ^a   Swart, J W ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b UNIVERSITY OF GIRONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; INFRARED SPECTROSCOPY; LIGHT TRANSMISSION; MATHEMATICAL MODELS; OPTICAL COATINGS; PLASMAS;

MATHEMATICA PROGRAM; PLASMA CHEMICAL VAPOR DEPOSITION; SILICON OXIDE;

SILICON COMPOUNDS;

EID: 33645510581     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2181577     Document Type: Article

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