Alignment of λ-DNA on organic monolayer surface patterned by scanning probe lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 2076-2081

  Shin, Minjung ^a   Kim, Taekeun ^a   Kwon, Chilwoo ^a   Kim, Seong Kyu ^a   Park, Jong Bae ^a,b   Lee, Haeseong ^b  

^a Sungkyunkwan University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

Author keywords

AFM; Alignment; APS; Combing; DNA; Lithography; Monolayer; Nanostructure; Nanowire; OTS

Indexed keywords

ALIGNMENT; ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; MONOLAYERS; PROBES; SILICON;

APS; COMBING; NANOSTRUCTURE; NANOWIRES; OTS;

DNA;

EID: 33645501803     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2076     Document Type: Article

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