Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 184-187

  Sakaguchi, Isao ^a   Ryoken, Haruki ^a   Hishita, Shunichi ^a   Haneda, Hajime ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Chemical vapor deposition; Electron cyclotron resonance plasma; Secondary ion mass spectrometry

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CYCLOTRONS; DEPOSITION; ELECTRONS; HYDROGEN; IMPURITIES; PLASMAS; RESONANCE; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; ZINC OXIDE;

C-AXIS ORIENTATION; ELECTRON CYCLOTRON RESONANCE PLASMA; ROCKING CURVE;

THIN FILMS;

EID: 33645243638     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.021     Document Type: Conference Paper

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