Fabrication of a planar polymeric deformation bragg sensor component by excimer laser radiation

IEEE Sensors Journal

Volumn 6, Issue 2, 2006, Pages 331-338

  Wochnowski, Carsten ^a,d   Kouamo, Michel Tchamo ^b   Pieper, Wilhelm ^c   Meteva, Krassimira ^a   Metev, Simeon ^a,e   Wenke, Gerhard ^c,f   Vollertsen, Frank ^a,e,g  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

^b HAMBURG UNIVERSITY OF APPLIED SCIENCES   (Germany)

^c HOCHSCHULE BREMEN   (Germany)

^d Bremer Institute of Applied Beam Technology   (Germany)

^e Bremen Inst of Appl Beam Technol   (Germany)

^f DUBLIN INSTITUTE OF TECHNOLOGY   (Ireland)

^g UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG SENSOR; EVANESCENT FIELD; POLYMER CHIP;

ELECTRIC NETWORK TOPOLOGY; EXCIMER LASERS; IRRADIATION; LITHOGRAPHY; OPTICAL WAVEGUIDES; PHOTOCHEMICAL REACTIONS; POLYMERS; POLYMETHYL METHACRYLATES; RADIATION; REFRACTIVE INDEX; ULTRAVIOLET DEVICES;

SENSORS;

EID: 33645163070     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2005.860319     Document Type: Article

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