Femtosecond-laser-assisted wet chemical etching of polymer materials

Journal of Applied Polymer Science

Volumn 100, Issue 2, 2006, Pages 1229-1238

  Wochnowski, C ^a   Hanada, Y ^b   Cheng, Y ^b   Metev, S ^a   Vollertsen, F ^a   Sugioka, K ^b   Midorikawa, K ^b  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Laser ablation; Microstructuring; Modification; Solution properties; Surface

Indexed keywords

ETCHING; LASER ABLATION; MICROSTRUCTURE; MODIFICATION; SURFACES; THERMOPLASTICS;

MICROSTRUCTURING; SOLUTION PROPERTIES;

POLYMERS;

CHEMICAL ETCHING; CHEMICAL MODIFICATION; IRRADIATION; LASER; MICROSTRUCTURE; THERMOPLASTIC POLYMER;

EID: 33645134953     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.23492     Document Type: Article

References (26)

1. Jain, K. Excimer Laser Lithography; SPIE Press: Washington, 1990.
2. Duley, W. W. UV-Lasers: Effects and Applications in Materials Science; Cambridge University Press: Cambridge, 1996; p 154.
3. Baudach, S.; Bonse, J.; Krüger, J.; Kautek, W. Appl Surf Sci 2000,154-155, 555.
4. von der Linde, D.; Sokolowski-Tinten K.; Bialkowski, J. Appl Surf Sci 1997, 109, 1.
5. Cheng, Y.; Sugioka, K.; Masuda, M.; Toyoda, K.; Kawachi, M.; Shihoyama, K.; Midorikawa, K. RIKEN Review 2003, 50, 101.
6. Cheng, Y.; Sugioka, K.; Midorikawa, K.; Masuda, M.; Toyoda, K.; Kawachi, M.; Shihoyama, K. Opt Lett 2003, 28, 1.
7. Masuda, M.; Sugioka, K.; Cheng, Y.; Aoki, N.; Kawachi, M.; Shihoyama, K. ; Toyoda, K.; Helvajian, H.; Midorikawa, K. Appl Phys A 2003, 76, 857.
8. Jones, D.; Scully, P. J.; Jaroszynski, D. A. Proc ICALEO'02 2002, 4, 2999.
9. Scully, P. J.; Jones, D.; Jaroszynski, D. A. J Opt A: Pure Appl Opt 2003, 5, S92.
10. Zoubir, A.; Lopez, C.; Richardson, M.; Richardson, K. Opt Lett 2004, 29, 1840.
11. Yamada, K.; Ishizuka, T.; Watanabe, W.; Itoh, K. Opt Express 2002, 10, 1173.
12. Ohta, K.; Kamata, M.; Obara, M. In Proceedings of Commercial and Biomedical Applications of Ultrafast Lasers IV; SPIE, 2004; Vol. 5340, p 172.
13. Kamata, M., Ohta, K., Obara, M. Proc 5th CLEO/Pacific Rim'03 2003, 2, 690.
14. Klein-Wiele, J.-H., Bekesi, J.; Ihlemann, J.; Simon, P. Proceedings of ILATA'03; SPIE, 2004; Vol. 5399, p 139.
15. Klein-Wiele, J.-H., Simon, P. Proceedings of LPM'03; SPIE, 2003; Vol. 5063, p 445.
16. Novembre, A. E.; Masakowski, L. M.; Hartney, M. A.; Polym Engineer Sci 1986, 26, 1158.
17. Merchant, D. F.; Scully, P. J.; Schmitt, N. F. Sens Actuators 1999, 76, 365.
18. Wong, Y. M.; Scully, P. J.; Kadim, H. J.; Alexiou, V.; Bartlett, R. J. J Opt A: Pure Appl Opt 2003, 5, S51.
19. Dyer, P. E. Appl Phys 2003, A77, 167.
20. Wochnowski, C.; Metev, S.; Sepold, G.; Appl Surf Sci 2000, 154-155, 706.
21. http://www.fbv.fh-frankfurt.de/mhwww/KKC-Vorlesung/5Qualitaet.htm
22. Rabek, J. F. Photodegradation of Polymers; Springer: Berlin, 1996; p 82.
23. Peeling, J.; Clark, D. T. Polym Degrad Stab 1980-1981, 3, 97.
24. Weir, N. A. Polym Degrad Stab 1982, 4, 143.
25. Srinivasan, R. Appl Phys 1993, A56, 417.
26. Rubahn, H.-G. Laseranwendung in der Oberflächenphysik und Materialbearbeitung, Teubner Verlag: Stuttgart, 1996; p 100.