Fabrication and properties of Sb-doped ZnO thin films grown by radio frequency (RF) magnetron sputtering

Journal of Crystal Growth

Volumn 290, Issue 1, 2006, Pages 56-60

  Wang, Peng ^a   Chen, Nuofu ^a,b   Yin, Zhigang ^a   Yang, Fei ^a   Peng, Changtao ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b INSTITUTE OF MECHANICS   (China)

Author keywords

A1. Crystal structure; A1. Thermal annealing; A1. X ray diffraction; A3. RF magnetron sputtering; B1. Zinc oxide; B2. Semiconducting II VI materials

Indexed keywords

FABRICATION; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ELECTRICAL PROPERTIES; RF MAGNETRON SPUTTERING; SEMICONDUCTING II-VI MATERIALS;

THIN FILMS;

EID: 33645033704     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.01.022     Document Type: Article

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