Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 252-256

  Liao, E B ^a,b   Teh, W H ^a   Teoh, K W ^a   Tay, A A O ^b   Feng, H H ^a   Kumar, R ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

BCB; Etch rate; Selectivity; Sidewall profile

Indexed keywords

BENZENE; DRY ETCHING; FLUORINE; PHOTORESISTORS; TITANIUM COMPOUNDS;

BCB; ETCH RATE; SELECTIVITY; SIDEWALL PROFILE;

PLASMA SOURCES;

EID: 33644904033     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.159     Document Type: Conference Paper

References (12)

1. G.J. Carchon, W.D. Raedt, and E. Beyne IEEE Trans. Microwave Theor. Tech. 52 2004 1244
2. J. Kawahara, K. Shiba, M. Tagami, M. Tada, S. Saito, T. Onodera, K. Kinoshita, M. Hiroi, A. Furuya, K. Kikuta, and Y. Hayashi Proc. VLSI Technol. Symp. Dig. 2000 20
3. B. Rogers, M.J. Berry, I. Turlik, P. Garrou, and D. Castillo ISHM '93 Proc. 1993 187
4. P.B. Chinoy IEEE Trans. CPMT 20 1997 199
5. W.R. Buchwald, and K. Vaccaro J. Vac. Sci. Technol., B 23 2005 51
6. D.O. Popa, B.-H. Kang, T.-J. Hwang, J.-Q. Lu, and H.E. Stephanou Proc. InterPack2003 2003 1
7. S.K. Kim, L. Xue, and S. Tiwari Mater. Res. Soc. Symp. Proc. 833 2005 G3.5.1
8. S.A. Vitale, H. Chae, and H.H. Sawin J. Vac. Sci. Technol., A, Vac. Surf. Films 18 2000 2770
9. Michael Schier J. Electrochem. Soc. 142 1995 3238
10. P.B. Chinoy, and J. Tajadod IEEE Trans. CHMT 16 1993 714
11. R. Boucher, U. Hubner, W. Morgenroth, H. Roth, H.-G. Meyer, M. Schmidt, and M. Eich Microelectron. Eng. 73-74 2004 330
12. S.R. Cain, F.D. Egitto, and F. Emmi J. Vac. Sci. Technol., A, Vac. Surf. Films 5 1987 1578