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Volumn 5992, Issue 2, 2005, Pages

Measuring line-edge roughness of masks with DUV light

Author keywords

E beam writer; LER; Line edge roughness; Mask inspection; Mask quality; Optical metrology

Indexed keywords

E-BEAM WRITER; LER; LINE EDGE ROUGHNESS; MASK INSPECTION; MASK QUALITY; OPTICAL METROLOGY;

EID: 33644593548     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633184     Document Type: Conference Paper
Times cited : (5)

References (2)
  • 1
  • 2
    • 0141570461 scopus 로고    scopus 로고
    • EUV photoresist performance results from the VNL and the EUV LLC
    • Jonathan L. Cobb et al., "EUV Photoresist Performance Results from the VNL and the EUV LLC," Proc. SPIE Int. Soc. Opt. Eng. 4688, 412 (2002)
    • (2002) Proc. SPIE Int. Soc. Opt. Eng. , vol.4688 , pp. 412
    • Cobb, J.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.