Fully ultrahigh-vacuum-compatible fabrication of submicrometer-spaced electrical contacts

Review of Scientific Instruments

Volumn 77, Issue 2, 2006, Pages

  Gartner C ^a   Hoffman, R ^a   Prez Willard F ^a   Sauter, M ^a   Surgers C ^a   Lohneysen H V ^a,b  

^a UNIVERSITY OF KARLSRUHE   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MASKS; NANOSTRUCTURED MATERIALS; SILICON NITRIDE; ULTRAHIGH VACUUM;

MACROSCOPIC MASKS; METALLIC CONTACTS; NANOSTRUCTURED STENCIL MASKS;

ELECTRIC CONTACTS;

EID: 33644591617     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2163973     Document Type: Article

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