Preferable orientation of turbostratic BN basal planes from an x-ray absorption study

Journal of Materials Research

Volumn 21, Issue 1, 2006, Pages 147-152

  Zhou, X T ^a   Sham, T K ^a   Chan, C Y ^b   Zhang, W J ^b   Bello, I ^b   Lee, S T ^b   Heigl, F ^c   Jurgenen A ^c   Hofsass H ^d  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSITY OF WISCONSIN MADISON   (United States)

^d UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; SILICON; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

FLUORESCENCE YIELD (FY); TURBOSTRATIC BORON NITRIDE BASAL PLANES; X RAY ABSORPTION NEAR-EDGE SPECTROSCOPY (XANES);

CUBIC BORON NITRIDE;

EID: 33644560288     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0005     Document Type: Article

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