Electron energy distribution function measurements in an inductively driven tandem plasma source

Plasma Processes and Polymers

Volumn 3, Issue 2, 2006, Pages 151-155

  Tsankov, Tsanko ^a   Kiss'ovski, Zhivko ^a   Djermanova, Nina ^a   Kolev, Stanimir ^a  

^a UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

Electron energy distribution function (EEDF); Inductively coupled plasmas; Langmuir electrostatic probe (LEP); Plasma sources

Indexed keywords

ARGON; ELECTRON ENERGY LEVELS; ELECTROSTATICS; INDUCED CURRENTS; MAXWELL EQUATIONS; PLASMA PROBES; PROBABILITY DISTRIBUTIONS;

ELECTRON-ENERGY DISTRIBUTION FUNCTION (EEDF); INDUCTIVELY-COUPLED PLASMAS; LANGMUIR ELECTROSTATIC PROBE (LEP);

PLASMA SOURCES;

EID: 33644508008     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200500092     Document Type: Article

References (13)

1. "Advanced Technologies Based on Wave and Beam Generated Plasmas", H. Schlüter, A. Shivarova, Eds., Kluwer, Dordrecht 1998.
2. J. Hopwood, Plasma Sources Sci. Technol. 1992, 1, 109.
3. H. J. Yoon, C. Charles, R. W. Boswell, J. Phys. D: Appl. Phys. 2005, 38, 2825.
4. M. B. Hopkins, M. Bacal, W. G. Graham, J. Phys. D: Appl. Phys. 1991, 24, 268.
5. M. B. Hopkins, W. G. Graham, Vacuum 1986, 36, 873.
6. V. A. Godyak, R. B. Piejak, B. M. Alexandrovich, Plasma Sources Sci. Technol. 2002, 11, 525.
7. M. J. Druyvesteyn Z. Phys. 1930, 64, 790.
8. H. Amemiya, J. Phys. D: Appl. Phys. 1990, 23, 999.
9. F. Fujita, H. Yamazaki, Jpn. J. Appl. Phys. 1990, 29, 2139.
10. E. Tatarova, F. M. Dias, J. Phys. IV 1998, 8, 257.
11. F. M. Dias, Plasma Sources Sci. Technol. 1995, 4, 86.
12. N. Djermanova, Zh. Kiss'ovski, Ts. Tsankov, Contrib. Plasma Phys., accepted for publication.
13. M. Dimitrova, N. Djermanova, Zh. Kiss'ovski, St. Kolev, A. Shivarova, Ts. Tsankov, Plasma Process. Polym. 2006, 3, 156.