Effective heights and tangential momentum accommodation coefficients of gaseous slip flows in deep reactive ion etching rectangular microchannels

Journal of Micromechanics and Microengineering

Volumn 16, Issue 3, 2006, Pages 493-504

  Jang, Jaesung ^a   Wereley, Steven T ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPRESSIBLE FLOW; GAS DYNAMICS; REACTIVE ION ETCHING; WALL FLOW;

FLOW GEOMETRY; GASEOUS SLIP FLOWS; RECTANGULAR MICROCHANNELS; TANGENTIAL MOMENTUM ACCOMMODATION COEFFICIENT (TMAC);

CHANNEL FLOW;

EID: 33344473738     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/16/3/004     Document Type: Article

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