Optical and electronic properties of HWCVD and PECVD silicon films irradiated using excimer and Nd:Yag lasers

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 125-128

  Shaikh, M Z ^a   O'Neill, K A ^a   Anthony, S ^a   Persheyev, S K ^a   Rose, M J ^a  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

Author keywords

Hot wire CVD; Hydrogen dilution; Laser crystallisation; Plasma enhanced CVD

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; LASER BEAM EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EXCIMER LASER ANNEALING (ELA); HOT-WIRE CVD; HYDROGEN DILUTION; LASER CRYSTALLIZATION;

THIN FILMS;

EID: 32644452909     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.138     Document Type: Conference Paper

References (9)

1. Y.F. Tang, S.R.P. Silva, and M.J. Rose Appl. Phys. Lett. 809220 2002 4154
2. S.K. Persheyev, D.M. Goldie, and M.J. Rose Thin Solid Films 395 2001 130
3. C.E. Nebel Phys. Status Solidi, A Appl. Res. 166 1998 667
4. D. Toet, T. Takehara, and M.O. Thompson J. Appl. Phys. 85 11 1999
5. A. Poruba, and A. Fejfar J. Appl. Phys. 88 1 2000 (1 July)
6. Yusuke Yogoro, Atsushi Masuda, and Hideki Matsumura Thin Solid Films 430 2003
7. P. Lengsfeld, N.H. Nickel, and W. Fuhs Appl. Phys. Lett. 76 13 2000
8. Daxing Han, H. Habuchi, and Qi Wang J. Appl. Phys. 87 4 1999 1882
9. P. Alpuim, and J.P. Conde J. Appl. Phys. 86 7 1999