Plasma energy transport to an electrically biased surface

International Journal of Heat and Mass Transfer

Volumn 47, Issue 19-20, 2004, Pages 4019-4029

  Yeh, F B ^a   Wei, P S ^b  

^a Chinese Naval Academy Kaohsiung   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

Biased surface; Energy transmission factor; Net current density; Plasma energy flux; Presheath; Sheath

Indexed keywords

DEPOSITION; MICROELECTROMECHANICAL DEVICES; PLASMA ETCHING; SEMICONDUCTOR DEVICES; SPUTTERING; SURFACE TREATMENT;

ELECTRON ENERGY FLUX; SPRAY DEPOSITION; TOTAL ENERGY FLUX;

ENERGY TRANSFER;

ENERGY; PLASMA;

EID: 3242721592     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijheatmasstransfer.2004.06.004     Document Type: Article

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