Characterizations of flash memory on glass using LTPS TFT with an ultra-low-roughness poly-Si/SiO2 interface

Digest of Technical Papers - SID International Symposium

Volumn 36, Issue 1, 2005, Pages 1152-1555

  Chen, Hung Tse ^a   Tsai, Po Hao ^a   Chen, Yu Cheng ^a   Chen, Chi Lin ^a   Lin, Jia Xing ^a   Chang, Jason C ^a   Chen, C W ^b   Lu, H Y ^b   Wu, H H ^b   Liu, P T ^b   Chang, T C ^c  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; FLASH MEMORY; GLASS; POLYSILICON; SURFACE ROUGHNESS;

LOW ROUGHNESS; PULSE TIME; STACK STRUCTURES;

INTERFACES (MATERIALS);

EID: 32244436804     PISSN: 0097966X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1889/1.2036205     Document Type: Conference Paper

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