Impact of Nitride Process Conditions on SONOS Flash Devices

Chung Cheng Ling Hsueh Pao/Journal of Chung Cheng Institute of Technology

Volumn 32, Issue 1, 2003, Pages 73-80

  Wu, Kuo Hong ^a   Chen, Tung Sheng ^a   Hsu, Shu Che ^a   Kao, Chin Hsing ^a  

^a NATIONAL DEFENSE UNIVERSITY   (Taiwan)

Author keywords

Charge trapping efficiency; Flash memory; SONOS

Indexed keywords

EID: 1642438058     PISSN: 02556030     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)