Dielectric and microstructural properties of Ba(Ti1-xZr x)O3 thin films on copper substrates

Ceramic Engineering and Science Proceedings

Volumn 26, Issue 5, 2005, Pages 109-116

  Ihlefeld, J F ^a   Maria, J P ^a   Borland, W ^b  

^a North Carolina State University   (United States)

^b DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; MICROSTRUCTURE; PERMITTIVITY; THIN FILMS;

AGILE DEVICES; METALLIC COPPER SUBSTRATE; WATER VAPOR;

BARIUM COMPOUNDS;

EID: 32044471625     PISSN: 01966219     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/9780470291252.ch11     Document Type: Conference Paper

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