High-resolution actinic defect inspection for extreme ultraviolet lithography multilayer mask blanks by photoemission electron microscopy

Applied Physics Letters

Volumn 88, Issue 5, 2006, Pages 1-3

  Neuhausler U ^a   Oelsner, A ^b   Slieh, J ^a   Brzeska, M ^a   Wonisch, A ^a   Westerwalbesloh, T ^a   Bruckl H ^a   Schicketanz, M ^c   Weber, N ^c   Escher, M ^c   Merkel, M ^c   Schonhense G ^b   Kleineberg, U ^a   Heinzmann, U ^a  

^a BIELEFELD UNIVERSITY   (Germany)

^b JOHANNES GUTENBERG UNIVERSITY   (Germany)

^c FOCUS GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MICROSCOPY; IMAGING TECHNIQUES; LITHOGRAPHY; PHOTOEMISSION;

ACTINIC DEFECT INSPECTION; FULL-FIELD IMAGING TECHNIQUE; PHOTOEMISSION ELECTRON MICROSCOPY; ULTRAVIOLET LITHOGRAPHY MULTILAYER MASK BLANKS;

ULTRAVIOLET RADIATION;

EID: 31944437554     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2168263     Document Type: Article

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