Preparation and characterization of BaTiO3 thick films with Li2O-SiO2 sintering aid

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 9 B, 2005, Pages 6878-6880

  Nakaiso, Toshiyuki ^a   Kageyama, Keisuke ^a   Ando, Akira ^a   Sakabe, Yukio ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

BaTiO3; Piezoelectric; Screen printing; Sintering aid; Thick film

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; FERROELECTRIC MATERIALS; PIEZOELECTRIC MATERIALS; PLATINUM; SINTERING; THICK FILMS;

FERROELECTRIC HYSTERESIS LOOPS; PIEZOELECTRIC CONSTANT; REMNANT POLARIZATION;

BARIUM COMPOUNDS;

EID: 31844437718     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.6878     Document Type: Article

References (13)

1. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya and M. Nakamura: Nature 432 (2004) 84.
2. A. Ando, M. Kimura and Y. Sakabe: Jpn. J. Appl. Phys. 42 (2003) 520.
3. Y. Guo, K. Kakimoto and H. Ohsato: Appl. Phys. Lett. 85 (2004) 4121.
4. T. Futakuchi, Y. Nakamura and M. Adachi: Jpn. J. Appl. Phys. 41 (2002) 6948.
5. G. H. Haertling: J. Am. Ceram. Soc. 82 (1999) 798.
6. S. Li and S. Chen: Sens. Actual. A 104 (2003) 151.
7. S. T. Mckinstry: J. Ceram. Soc. Jpn. 109 (2001) s76.
8. K. Tanaka, T. Kubota and Y. Sakabe: Sens. Actual. A 96 (2002) 179.
9. B. S. Purwasasmita, E. Hoshi and T. Kimura: J. Ceram. Soc. Jpn. 109 (2001) 191.
10. T. Hayashi, T. Hasegawa, J. Tomizawa and Y. Akiyama: Jpn. J. Appl. Phys. 42 (2003) 6074.
11. Q. M. Wang and L. E. Cross: Ferroelectrics 215 (1998) 187.
12. T. Iijima, S. Ito and H. Matsuda: Jpn. J. Appl. Phys. 41 (2002) 6735.
13. S. Okamoto, S. Yokoyama, Y. Honda, G. Asano and H. Funakubo: Jpn. J. Appl. Phys. 43 (2004) 6567.