Low-temperature growth and characterization of epitaxial YMnO 3/Y2O3/Si MFIS capacitors with thinner insulator layer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 9 B, 2005, Pages 6977-6980

  Haratake, Kohei ^a   Shigemitsu, Norimichi ^a   Nishijima, Masanori ^a   Yoshimura, Takeshi ^a   Fujimura, Nirufumi ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Epitaxial films; Ferroelectric gate capacitor; Pulsed capacitance voltage (C V) measurement; Y2O3; YMnO3

Indexed keywords

EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; OPTIMIZATION; PULSED LASER DEPOSITION; SEMICONDUCTOR LASERS;

EPITAXIAL FILMS; FERROELECTRIC-GATE CAPACITORS; PLD SYSTEM;

YTTRIUM COMPOUNDS;

EID: 31844435609     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.6977     Document Type: Article

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