Theoretical investigation on the electronic structure of the tris-(8-hydroxyquinolinato) aluminum/aluminum interface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 B, 2006, Pages 413-416

  Yanagisawa, Susumu ^a,b   Morikawa, Yoshitada ^a,b,c  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Alq3 metal interface; Electron injection barrier; Interfacial dipole layer; Work function

Indexed keywords

ELECTRON DENSITY MEASUREMENT; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; INTERFACES (MATERIALS); SURFACE ROUGHNESS;

ALQ3/METAL INTERFACES; ELECTRON INJECTION BARRIER; INTERFACIAL DIPOLE LAYERS; WORK FUNCTION;

ALUMINUM COMPOUNDS;

EID: 31844434079     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.413     Document Type: Article

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