In-situ RHEED of atomic layer deposition

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 555-562

  Bankras, R G ^a   Holleman, J ^a   Schmilz, J ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DEPOSITION; DIELECTRIC MATERIALS; MOLECULAR STRUCTURE; REFLECTION;

ALUMINUM ATOMS; ATOMIC LAYER DEPOSITION (ALD); REFLECTED INTENSITY;

REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

EID: 31744432499     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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