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Volumn 288, Issue 1, 2006, Pages 44-48
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Effect of rapid thermal annealing on the properties of GaNAs thin films grown by molecular beam epitaxy
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Author keywords
A1. Annealing; A3. MBE; B1. GaNAs
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Indexed keywords
ANNEALING;
LATTICE CONSTANTS;
MOLECULAR BEAM EPITAXY;
NITROGEN;
PLASMAS;
RAPID THERMAL ANNEALING;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
GANAS;
HIGH-RESOLUTION X-RAY DIFFRACTION (HRXRD);
RAMAN INTENSITY;
VIBRATION MODES;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 31644448002
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.12.045 Document Type: Conference Paper |
Times cited : (7)
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References (12)
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