Low-temperature reactive ion etching and microwave plasma etching of silicon

Applied Physics Letters

Volumn 52, Issue 8, 1988, Pages 616-618

  Tachi, Shinichi ^a   Tsujimoto, Kazunori ^a   Okudaira, Sadayuki ^a  

^a HITACHI LTD   (Japan)

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EID: 36549100931     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.99382     Document Type: Article

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