The visible and near IR photoluminescent response of nc-Si:Er thin films produced by rf sputtering

Nanotechnology

Volumn 15, Issue 7, 2004, Pages 802-806

  Cerqueira, M F ^a   Monteiro, T ^b   Stepikhova, M V ^c,d   Losurdo, M ^d   Soares, M J ^b   Gomes, Isabel ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^d CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); GRAIN BOUNDARIES; MATHEMATICAL MODELS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SILICON ALLOYS; SPUTTERING;

CRYSTALLINE FRACTIONS; LUMINESCENCE EFFICIENCY; NANOSTRUCTURES; PHOTOLUMINESCENCE (PL);

THIN FILMS;

EID: 3142745655     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/7/015     Document Type: Article

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