Study of ZnO nanocluster formation within styrene-acrylic acid and styrene-methacrylic acid diblock copolymers on Si and SiO2 surfaces

Solid-State Electronics

Volumn 48, Issue 10-11 SPEC. ISS., 2004, Pages 2025-2030

  Ali, H A ^a   Iliadis, A A ^a   Lee, U ^b  

^a UNIVERSITY OF MARYLAND   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ACRYLICS; ATOMIC FORCE MICROSCOPY; COPOLYMERS; DOPING (ADDITIVES); PHASE SEPARATION; PHOTOLITHOGRAPHY; PIEZOELECTRICITY; POLYSTYRENES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICA; SOLAR CELLS; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

LAMELLAR MORPHOLOGY; MOLECULAR MASS; NANOCLUSTER FORMATIONS; PHOTOLITHOGRAPHIC PATTERNING;

NANOSTRUCTURED MATERIALS;

EID: 3142684802     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2004.05.052     Document Type: Conference Paper

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