Impact of air filter material on metal oxide semiconductor (MOS) device characteristics in HF vapor environment

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 5 B, 2004, Pages

  Hsiao, Chih Wen ^a   Lou, Jen Chung ^a   Yeh, Ching Fa ^a   Hsieh, Chih Ming ^a   Lin, Shiuan Jeng ^a   Kusumi, Toshio ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b DAIKIN INDUSTRIES LTD   (Japan)

Author keywords

Contamination; Glass fiber filter; HF vapor; PTFE filter; Trace doping

Indexed keywords

AIR FILTERS; AIR POLLUTION CONTROL; CONTAMINATION; CORROSION RESISTANCE; DOPING (ADDITIVES); GLASS FIBERS; TRACE ELEMENTS; VAPORS;

AIRBORNE MOLECULAR CONTAMINATION (AMC); GLASS FIBER FILTERS; HF VAPOR; PTFE FILTERS; TRACE DOPING;

MOS DEVICES;

EID: 3142684669     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l659     Document Type: Article

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