Effect of airborne contaminants in the cleanroom for ULSI manufacturing process

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1995, Pages 322-326

  Tamaoki, Makiko ^a   Nishiki, Kazuhiro ^a   Shimazaki, Ayako ^a   Sasaki, Yumi ^a   Yanagi, Sachiko ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR FILTERS; AMINES; CLEAN ROOMS; CRYSTAL IMPURITIES; ELECTRIC BREAKDOWN OF SOLIDS; ESTERS; GAS CHROMATOGRAPHY; INDOOR AIR POLLUTION; MASS SPECTROMETRY; SILICA; SILICON WAFERS; ULSI CIRCUITS;

AIRBORNE ORGANIC CONTAMINANTS; BREAKDOWN FIELD STRENGTH;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0029541012     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)