Radial distribution function analyses of amorphous carbon thin films containing various levels of silicon and hydrogen

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 273-279

  Evans, R D ^a,b   Bentley, J ^c   More, K L ^c   Doll, G L ^a   Glass, J T ^b,d  

^a TIMKEN COMPANY   (United States)

^b Case Western Reserve University   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND ANGLES; ENERGY-FILTERED CONVERGENT-BEAM ELECTRON DIFFRACTION (EFCBED); RADIAL DISTRIBUTION FUNCTIONS (RDF); REACTIVE SPUTTERING;

CHEMICAL BONDS; COMPRESSIVE STRESS; ELECTRON DIFFRACTION; ELECTRON ENERGY LEVELS; HARDNESS; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SILICON CARBIDE; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS FILMS;

EID: 3142659635     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1760232     Document Type: Article

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