1.5 μm to 0.87 μm optical upconversion using wafer fusion technology

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 788-791

  Luo, H ^a   Ban, D ^a   Liu, H C ^a   Springthorpe, A J ^a   Wasilewski, Z R ^a   Buchanan, M ^a   Glew, R ^b  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b Bookham Technology   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY RESONATORS; CHARGE COUPLED DEVICES; EPITAXIAL GROWTH; HETEROJUNCTIONS; INFRARED IMAGING; LIGHT ABSORPTION; LIGHT EMITTING DIODES; PHOTOCURRENTS; PHOTODETECTORS; PHOTOTRANSISTORS; QUANTUM EFFICIENCY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; THERMAL EFFECTS;

FOCAL PLANE ARRAYS (FPA); NEAR INFRARED (NIR) IMAGING; OPTICAL UPCONVERSION DEVICES; WAFER FUSION TECHNOLOGY;

OPTICAL SYSTEMS;

EID: 3142529285     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1689300     Document Type: Conference Paper

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