Magnetic metal etching with organic based plasmas. I. CO/H 2 plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 4, 2005, Pages 1589-1596

  Orland, A S ^a   Blumenthal, R ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETHENEDIOL; FORMIC ACID; PLASMA SAMPLING;

CARBON MONOXIDE; FISCHER-TROPSCH SYNTHESIS; MASS SPECTROMETRY; NICKEL;

PLASMA ETCHING;

EID: 31144470561     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1935530     Document Type: Article

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